The photoelectric performances of quantum well structures brought up by a method of the MOS-hydride epitaxy and sensitive in the 3-5 mm range
The authors: Vasilevskaya L. M., Kuznetsov Yu. A., Kulikov V. B., Khatuntsev A. I., Budkin I. V., Bulaev P. V., Zalevsky I. D., Marmalyuk A. A., Nikitin D. B., Padalitsa A. A., Petrovsky A. V.
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